MM Double-tank cell 2 x 15 mL - Magnetic Mount Double-tank Etch Cell BDD ) can be easily punched

) can be easily punched from the metal foil and directly loaded into cell

2 m2/L at 1 mm thickness

If air bubbles are present around the porous frit

Various auxiliary electrodes are suitable for this cell including metal wire and metal foil/mesh/foam electrodes as well as graphite rod

The reference electrode tip should be placed close to the bottom of the chamber

MM Double-tank cell 2 x 15 mL - Magnetic Mount Double-tank Etch Cell BDD ) can be easily punchedThis is a horizontally mounted, double tank cell typically used for anodization of Si wafers with electrolyte backside contact. It consists of two polyether ether ketone (PEEK) gas tight chambers each equipped with sapphire wafer serving as window for illumination allowing light assisted porous Si formation. It well fits aqueous (FKM EPDM O Rings) and organic solvent (FFKM O Rings) electrolyte requirements. The Si substrate is mounted in between these